基區(qū)變化對p-i-n型二極管性能的影響
[Abstract]:Compared with p-n junction diodes, p-i-n diodes have added an intrinsic region (also known as base region), which makes it more widely used in power electronics, optoelectronics, such as rectifier, limiting, RF, photodetector, etc. Changes in the base region can affect the performance of the diode. MATLAB is used to simulate the characteristics of barrier injection transition time (BARITT) diodes for In (Al) xGa (1-x) N materials with different components. The relationship between current and voltage, conductance to voltage per unit area, and the relationship between boundary point and voltage in low field and base region are analyzed. The negative resistance characteristics and the relationship between conductance, electrical conductivity and frequency of the two materials are compared. The p-type nanocrystalline silicon / n- type monocrystalline silicon (p) nc-Si/ (n-) c-Si/ (n) nc-Si fast recovery diode has been fabricated by using PECVD technique. Furthermore, a controlled backside hole injection (CIBH) structure has been formed by embedding a (p) nc-SiC buried layer on one side of the cathode junction base region of p-type nanocrystalline silicon / n- type nanocrystalline silicon (p) nc-Si/ (n-) c-Si/ (n) nc-Si. The capacitance-voltage relationship, current-voltage curve and reverse recovery waveform of diodes without (p) nc-SiC buried layer are compared. The important role of (p) nc-SiC in the dynamic and static process of diodes is discussed. The results show that the avalanche resistance and reverse recovery of the diodes with (p) nc-SiC buried layer are improved.
【學(xué)位授予單位】:溫州大學(xué)
【學(xué)位級別】:碩士
【學(xué)位授予年份】:2017
【分類號】:TN312.4
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