發(fā)布時(shí)間：2018-01-04 10:12

  本文關(guān)鍵詞：差動(dòng)式邁克爾遜干涉納米位移測(cè)量方法研究　出處：《浙江理工大學(xué)》2015年碩士論文　論文類(lèi)型：學(xué)位論文

  更多相關(guān)文章： 納米位移測(cè)量 激光干涉儀 差動(dòng)式 邁克爾遜干涉儀 相位差測(cè)量

【摘要】：隨著精密加工、微電子等行業(yè)的快速發(fā)展，，對(duì)高精度位移測(cè)量技術(shù)的需求越來(lái)越大，性能要求也越來(lái)越高。本文依托國(guó)家自然科學(xué)基金(NO.51205365)，設(shè)計(jì)了一種差動(dòng)式邁克爾遜干涉納米位移測(cè)量方法，并對(duì)測(cè)量方法的各項(xiàng)關(guān)鍵技術(shù)進(jìn)行了研究，通過(guò)搭建完整的測(cè)量系統(tǒng)，最終實(shí)現(xiàn)納米級(jí)精度的位移測(cè)量。 論文介紹了國(guó)內(nèi)外納米位移測(cè)量技術(shù)的研究現(xiàn)狀，提出了一種差動(dòng)式邁克爾遜干涉納米位移測(cè)量方法，對(duì)差動(dòng)式邁克爾遜干涉納米位移測(cè)量的原理進(jìn)行了詳細(xì)的介紹，對(duì)測(cè)量系統(tǒng)的光路結(jié)構(gòu)進(jìn)行了設(shè)計(jì)，對(duì)系統(tǒng)機(jī)械支撐結(jié)構(gòu)進(jìn)行設(shè)計(jì)與有限元受力分析；設(shè)計(jì)了信號(hào)預(yù)處理電路與電壓轉(zhuǎn)化電路，用于改善干涉信號(hào)質(zhì)量以及調(diào)整信號(hào)電壓范圍；設(shè)計(jì)了高精度的干涉信號(hào)相位差測(cè)量方法，并對(duì)相位差測(cè)量精度與分辨率進(jìn)行了實(shí)驗(yàn)驗(yàn)證；設(shè)計(jì)了相位差測(cè)量速度補(bǔ)償方法，對(duì)相位差測(cè)量過(guò)程中速度變化引起的誤差進(jìn)行了分析與補(bǔ)償；對(duì)大數(shù)計(jì)數(shù)的測(cè)量原理進(jìn)行了介紹，并對(duì)參考鏡移動(dòng)方向判斷方法進(jìn)行了設(shè)計(jì)；運(yùn)用C語(yǔ)言對(duì)DSP進(jìn)行了軟件設(shè)計(jì)，運(yùn)用VB設(shè)計(jì)了上位機(jī)的系統(tǒng)控制軟件。 為驗(yàn)證本文所構(gòu)建的差動(dòng)式邁克爾遜干涉納米位移測(cè)量系統(tǒng)的可行性與有效性，搭建了實(shí)驗(yàn)平臺(tái)，分別進(jìn)行了以下實(shí)驗(yàn)：(1)相位差測(cè)量補(bǔ)償對(duì)比實(shí)驗(yàn)，分別以50nm、200nm為步長(zhǎng)進(jìn)行了對(duì)比位移測(cè)量實(shí)驗(yàn)，步長(zhǎng)為50nm時(shí)，補(bǔ)償后測(cè)量誤差的標(biāo)準(zhǔn)偏差由1.0108nm減小為0.5686nm，誤差平均偏差由0.7648nm減小為0.4616nm；步長(zhǎng)為200nm時(shí)，補(bǔ)償后測(cè)量誤差標(biāo)準(zhǔn)偏差由1.4188nm減小為0.5687nm，誤差平均偏差由1.1115nm減小為0.4838nm。(2)小數(shù)計(jì)數(shù)位移測(cè)量實(shí)驗(yàn)，分別進(jìn)行了5nm、10nm、20nm、50nm步長(zhǎng)的位移測(cè)量實(shí)驗(yàn)，測(cè)量誤差的標(biāo)準(zhǔn)偏差分別為0.4697nm、0.6317nm、0.7594nm、0.6644nm。(3)大數(shù)計(jì)數(shù)位移測(cè)量時(shí)實(shí)驗(yàn)，分別在正反向下進(jìn)行了驗(yàn)證實(shí)驗(yàn)，以0.5μm為步長(zhǎng)，在0-7μm的范圍內(nèi)驗(yàn)證大數(shù)計(jì)數(shù)的準(zhǔn)確性，結(jié)果為大數(shù)計(jì)數(shù)誤差均小于半個(gè)波長(zhǎng)，與干涉條紋位移測(cè)量理論相符，大數(shù)計(jì)數(shù)正確。(4)大小數(shù)結(jié)合位移測(cè)量實(shí)驗(yàn)，分別在1μm與7μm下進(jìn)行了重復(fù)性位移測(cè)量實(shí)驗(yàn)，測(cè)量的誤差標(biāo)準(zhǔn)偏差分別為1.3199nm與0.9184nm，平均偏差分別為1.1057nm與0.9179nm。上述實(shí)驗(yàn)表明本文測(cè)量方法能夠?qū)崿F(xiàn)納米精度位移測(cè)量，并且具有良好的可靠性與穩(wěn)定性。
[Abstract]:With the rapid development of precision machining, microelectronics and other industries, the demand for high-precision displacement measurement technology is increasing. The performance requirements are becoming higher and higher. A differential Michelson interferometric nano-displacement measurement method is designed based on the National Natural Science Foundation of China (NSFC) no. 51205365. The key technologies of the measurement method are studied, and the displacement measurement with nanometer precision is finally realized by building a complete measuring system. This paper introduces the research status of nano-displacement measurement technology at home and abroad, and proposes a differential Michelson interferometric nano-displacement measurement method. The principle of differential Michelson interferometric nano-displacement measurement is introduced in detail. The optical structure of the measurement system is designed, and the mechanical support structure of the system is designed and analyzed by finite element method. The signal preprocessing circuit and the voltage conversion circuit are designed to improve the interference signal quality and adjust the voltage range of the signal. The phase difference measurement method of high precision interference signal is designed, and the precision and resolution of phase difference measurement are verified by experiment. The velocity compensation method of phase difference measurement is designed, and the error caused by velocity change in phase difference measurement is analyzed and compensated. The measuring principle of large number counting is introduced, and the method of determining the moving direction of reference mirror is designed. C language is used to design the software of DSP and VB is used to design the system control software of upper computer. In order to verify the feasibility and effectiveness of the differential Michelson interferometric nanoscale displacement measurement system, an experimental platform was set up, and the following experiments were carried out respectively. The displacement measurement experiments were carried out with the step size of 50nm ~ 200nm respectively. When the step size is 50nm, the standard deviation of measurement error after compensation is reduced from 1.0108nm to 0.5686nm. The average error deviation was reduced from 0.7648 nm to 0.4616 nm. When the step size is 200nm, the standard deviation of measurement error is reduced from 1.4188nm to 0.5687nm. The average error deviation was reduced from 1.1115nm to 0.4838nm.m-2). The standard deviation of measurement error is 0.4697 nm ~ 0.6317 nm ~ (-1) ~ 0.7594nm, respectively. When measuring the displacement of large number count, the experiments were carried out in both positive and negative direction. The accuracy of large number counting was verified in the range of 0-7 渭 m with 0.5 渭 m as step. The results show that the error of large number counting is less than half wavelength, which is consistent with the theory of interference fringes displacement measurement, and the large number count is correct. The repeatable displacement measurement experiments were carried out at 1 渭 m and 7 渭 m, respectively. The error standard deviations were 1.3199 nm and 0.9184 nm, respectively. The average deviations are 1.1057nm and 0.9179nmrespectively. The experimental results show that the proposed method can realize the displacement measurement with nanometer precision and has good reliability and stability.
【學(xué)位授予單位】：浙江理工大學(xué)
【學(xué)位級(jí)別】：碩士
【學(xué)位授予年份】：2015
【分類(lèi)號(hào)】：TH744.3;TP274

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